Plasma ion assisted deposition of aluminium oxide and aluminium oxifluoride layers for applications in the ultraviolet spectral range |
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Authors: | O. StenzelD. Gä bler,S. Wilbrandt,N. KaiserH. Steffen,A. Ohl |
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Affiliation: | a Fraunhofer Institute for Applied Optics and Precision Engineering IOF, Albert-Einstein-Str. 7, 07745 Jena, Germany b Leibniz-Institut für Plasmaforschung und Technologie e.V., Felix-Hausdorff-Str. 2, 17489 Greifswald, Germany |
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Abstract: | We present extended experimental material about optical and mechanical properties as well as the water content of aluminium oxide films, deposited by plasma ion assisted electron beam evaporation. A clear correlation between these experimental data is established and understood as being affected by the different degree of the porosity of the films. When adding fluorine as a reactive gas during deposition, aluminium oxifluoride layers can be obtained that appear nearly free of water, and combine UV-transparency with higher UV refractive indices than porous aluminium oxide layers. |
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Keywords: | Aluminium oxide Aluminium oxifluoride Optical constants Optical coating Ultraviolet |
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