| 光掩模现状与展望 |
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| 引用本文： | 孙锋,肖力. 光掩模现状与展望[J]. 电子与封装, 2006, 6(7): 8-11 |
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| 作者姓名： | 孙锋 肖力 |
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| 作者单位： | 中国电子科技集团第五十八研究所,江苏,无锡,214035;中国电子科技集团第五十八研究所,江苏,无锡,214035 |
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| 摘 要： | 0．09μm工艺用掩模在国外进入批量生产,0．065μm对应掩模成为研发重点,新一代电子束投影曝光技术、低加速电压电子线等倍接近曝光技术、超紫外线曝光技术的候补技术光掩模的研究与开发已成为备受关注的课题。国内光掩模制造业仅能够满足国内中低档产品市场的要求。
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| 关 键 词： | 掩模技术 掩模市场 掩模展望 |
| 文章编号： | 1681-1070（2006）07-0008-04 |
| 收稿时间： | 2006-03-01 |
| 修稿时间： | 2006-03-01 |
Current Status and Prospects of Photomasks |
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| SUN Feng,XIAO Li. Current Status and Prospects of Photomasks[J]. Electronics & Packaging, 2006, 6(7): 8-11 |
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| Authors: | SUN Feng XIAO Li |
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| Affiliation: | China Electronics Technology Group Corporation No.58 Research Institute, Wuxi Jiangsu 214035, China |
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| Abstract: | Photomasks for 0.09-micron processes are now in mass production abroad, and great efforts have been made on the research and development of photomasks for 0.065-micron processes. Close attention has been paid to the research and development of the photomasks for candidate technologies, such as new- generation electron beam projection lithography, low acceleration-voltage electron line equal multiple proximity lithography, and super UV lithography. The photomask making industry in China can only meet the requirements of the domestic medium and low-end product market. |
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| Keywords: | photomask technology photomask market prospects of photomasks |
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