钨掺杂二氧化钒薄膜的THz波段相变性能的研究

通过溶胶–凝胶法制备纯的VO₂和W掺杂的VO₂薄膜, 并且进行了XPS、AFM和XRD的分析与表征, 并观察了其微观形貌和结构. 同时研究了VO₂和W掺杂VO₂在红外光谱(λ=4 μm)和THz(0.3~1.0 THz)区域的金属–绝缘转变性能. 结果表明: 室温下W掺杂的VO₂薄膜在红外和THz区域的初始透过率都比纯的VO₂薄膜低. 在THz波段, W掺杂的VO₂表现出更低的相变温度. 同时在VO₂和W掺杂VO₂相变过程中, 观察到了金属–绝缘转变和结构转变的现象, W掺杂VO₂具有明显的峰位偏移现象.

Study on Phase Transition Property of Tungsten-doped Vanadium Dioxide Thin Film at Terahertz Range

Vanadium dioxide and tungsten-doped (W-doped) vanadium dioxide thin films deposited by aqueous Sol-Gel method were characterized with several different techniques (i.e. X-ray photoelectron spectroscope, atomic force microscope, X-ray diffraction), to determine their morphology and microstructure. Their metal-to-insulator (MIT) phase transition behavior in infrared spectral region (λ=4 μm) and terahertz (THz) spectral region (0.3–1.0 THz) were observed respectivele. The results demonstrate that the transmittance of W-doped VO 2 film at room temperature is visibly lower than that of undoped VO 2 film in both infrared and terahertz spectral region. The transition temperature of W-doped VO 2 film is also lower than that of undoped VO 2 film in the THz range. The MIT and structural phase transition (SPT) are observed during the phase transition of VO 2 and W-doped VO 2 , and an obvious change of peak position occurs in W-doped VO 2 film.