| Ti-Al-Zr靶材的多弧离子镀沉积过程的模拟研究 |
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| 引用本文： | 赵时璐,张震. Ti-Al-Zr靶材的多弧离子镀沉积过程的模拟研究[J]. 机械设计与制造, 2007, 0(5): 137-139 |
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| 作者姓名： | 赵时璐 张震 |
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| 作者单位： | 1. 东北大学,材料与冶金学院,沈阳,110004
2. 华晨宝马汽车有限公司,涂装车间,沈阳,110044 |
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| 摘 要： | 本文模拟了Ti-Al-Zr靶材的多弧离子镀的镀膜过程.通过对圆柱形镀膜室-偏压电场的模拟,讨论了在不同的偏压电场下粒子的运动特性、成分离析效应的影响因素、涂层成分均匀性的影响因素,模拟结果与实际的镀膜实验相符.
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| 关 键 词： | 多弧离子镀 镀膜过程 Ti-Al-Zr靶材 成分 靶材 多弧离子镀 沉积过程 模拟研究 target plating cathodic deposition process simulation 实验 镀膜室 模拟结果 均匀性 成分离析 涂层 影响因素 效应 运动特性 粒子 偏压电场 |
| 文章编号： | 1001-3997(2007)05-0137-03 |
| 修稿时间： | 2006-08-07 |
A study on simulation of deposition process in cathodic arcion plating for target Ti-Al-Zr |
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| ZHAO Shi-lu,ZHANG Zhen. A study on simulation of deposition process in cathodic arcion plating for target Ti-Al-Zr[J]. Machinery Design & Manufacture, 2007, 0(5): 137-139 |
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| Authors: | ZHAO Shi-lu ZHANG Zhen |
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| Affiliation: | 1.Department of mechanism engineering, Shenyang University, Shenyang 110004,China;2.Paint shop, BMW Brilliance Automotive, Shenyang 110044,China |
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| Abstract: | The essay summarizes the simulation of deposition process in cathodic arc ion plating for target Ti-Al-Zr. Through the bias voltage electric field in cylinder-like vacuum chamber is simulated, the movement characteristics of particles in the different bias voltage electric fields, the composition demixing effect and the effected factors of coating composition uniformity have been discussed. All these are accorded with the real deposition experiment. |
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| Keywords: | Cathodic arc ion plating Deposition process Target Ti-Al-Zr Composition |
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