| Abstract: | In this paper,an N-doped titanium oxide(TiO_2)photocatalyst is deposited by a plasma-enhanced atomic layer deposition(PEALD)system through the in-situ doping method.X-ray photoelectron spectroscopy(XPS)analysis indicates that substitutional nitrogen atoms(~395.9 eV)with 1 atom%are effectively doped into TiO_2 films.UV-VIS spectrometry shows that the in-situ nitrogen doping method indeed enhances the visible-activity of TiO_2 films in the425-550 nm range,and the results of the performance tests of the N-doped TiO_2 films also imply that the photocatalysis activity is improved by in-situ doping.The in-situ doping mechanism of the N-doped TiO_2 film is suggested according to the XPS results and the typical atomic layer deposition process. |
