Effect of the titanium ion concentration on electrodeposition of nanostructured TiNi films |
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Authors: | Hae-Min Lee Santosh K Mahapatra John Kiran Anthony Fabian Rotermund Chang-Koo Kim |
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Affiliation: | (1) Division of Energy Systems Research, Ajou University, San 5 Woncheon-dong, Yeongtong-gu, Suwon, 443-749, Korea;(2) Present address: Department of Applied Physics, Birla Institute of Technology, Mesra, Ranchi, 835215, India |
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Abstract: | Electrodeposition of nanostructured titanium–nickel films was performed and the effect of the concentration of the titanium
source on the film characteristics was investigated. Scanning electron microscopy indicated circular crystallites on the surface
of the electrodeposited titanium–nickel film with a fairly uniform size distribution. XRD studies showed that the electrodeposited
TiNi films contained TiNi with a preferred crystallographic orientation of 002]. Surface analysis using X-ray photoelectron
spectroscopy (XPS) revealed that the electrodeposited titanium–nickel film contained elemental titanium and nickel, hydroxide
of nickel, and oxides of titanium and nickel. As the titanium ion concentration was increased, the titanium content in the
film was increased while the deposition rate and crystallite size of the film were decreased. A blue-shift in the UV/Vis peak
was also observed with increasing titanium ion concentration. |
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Keywords: | |
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