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Temperature dependence of the surface diffusion distance of bismuth atoms adsorbed on mica,carbon and silicon monoxide surfaces
Authors:H. Terajima  S. Fujiwara
Affiliation:Institute for Optical Research, Tokyo Kyôiku University, 3-22-17, Hyakunincho, Shinjuku-ku, Tokyo 160 Japan
Abstract:The mean distance of surface diffusion of bismuth adatoms on mica, carbon and silicon monoxide surfaces has been determined at different temperatures by measurement of the instantaneous sticking coefficient and the nucleus density.The surface diffusion distance has been found to increase with decreasing temperature in accordance with the formula
X=12a0v0dv0a12expEa ? Ed2RT
at temperatures above 413, 373 and 383 K for mica, carbon and silicon monoxide respectively. Here X is one-half of the diffusion distance, Ea is the adsorption energy, Ed the activation energy for surface diffusion, a0 the diffusion jump distance and v0a and v0d the vibrational frequencies associated with re-evaporation and with surface diffusion respectively. Below these temperatures it has been found that the temperature dependence of the diffusion distance deviates from the above formula; this can be explained by the presence of residual gas molecules adsorbed on the surfaces.From the temperature dependence of the diffusion distance, the respective values of the pre-exponential term a0 (v0dv0a)12 and the difference of energies Ea?Ed have been estimated as 7.6 Å and 5.8 kcal mol?1 for mica, 17 Å and 3.2 kcal mol?1 for carbon and 58 Å and 1.3 kcal mol?1 for silicon monoxide.
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