Infrared waveguide fabrications with an E-beam evaporated chalcogenide glass film |
| |
| Authors: | XM Yang Yaping Zhang Ahad Syed |
| |
| Affiliation: | 1. Advanced Nanofabrication, Imaging and Characterization, Core Lab, King Abdullah University of Science and Technology, Thuwal, Saudi Arabiayang0355@e.ntu.edu.sg;3. Photonics Laboratory, Physical Sciences and Engineering Division, King Abdullah University of Science and Technology, Thuwal, Saudi Arabia;4. Advanced Nanofabrication, Imaging and Characterization, Core Lab, King Abdullah University of Science and Technology, Thuwal, Saudi Arabia |
| |
| Abstract: | Chalcogenide glasses have a variety of unique optical properties due to the intrinsic structural flexibility and bonds metastability. They are desirable materials for many applications, such as infrared communication sensors, holographic grating, optical imaging, and ultrafast nonlinear optic devices. Here, we introduce a novel electron-beam evaporation process to deposit the good quality arsenic trisulfide (As2S3) films and then the As2S3 films were used to fabricate the As2S3 waveguides with three approaches. The first method is photoresist lift-off. Because of the restriction of thermal budget of photoresist, the As2S3 film must be deposited at the room temperature. The second one is the silicon dioxide lift-off process on sapphire substrates, in which the As2S3 film could be evaporated at a high temperature (>180 °C) for better film quality. The third one is the plasma etching process with a metal protective thin layer in the pattern development process. |
| |
| Keywords: | chalcogenide glass As2S3 electron-beam evaporation waveguide lift-off plasma etching |
|
|
