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Low-cost direct writing lithography system for the sub-micron range |
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| Authors: | Holger Becker Reinhard Caspary Christian Toepfer Manfred V Schickfus Siegfried Hunklinger |
| Affiliation: | 1. Institut für Angewandte Physik, Universit?t Heidelberg , Albert überle Str. 3-5, D-69120, Heidelberg, Germany;2. Imperial College, Department of Chemistry , South Kensington, London, SW7 2AY, UK;3. Institut für Angewandte Physik, Universit?t Heidelberg , Albert überle Str. 3-5, D-69120, Heidelberg, Germany |
| Abstract: | Abstract We have developed a fixed beam direct writing laser lithography system with a minimum feature size of 400nm at 457nm wavelength and a writing speed of 4·2mm/s with total system costs of less than 100 000 US$. |
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