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Sn、W掺杂对Ag/Ni材料界面结合性能的研究
引用本文:贾佶颖,王景芹,郭培健. Sn、W掺杂对Ag/Ni材料界面结合性能的研究[J]. 有色金属工程, 2022, 0(11)
作者姓名:贾佶颖  王景芹  郭培健
作者单位:河北工业大学省部共建电工装备可靠性与智能化国家重点实验室,河北工业大学省部共建电工装备可靠性与智能化国家重点实验室,天津电气科学研究院有限公司
基金项目:国家自然科学基金(51777057);中央引导地方科技项目(216Z1011G)
摘    要:本文采用第一性原理赝势法,计算并分析Ag(110)/Ni(211)界面体系的能量与电子结构,讨论Sn、W掺杂前后对Ag/Ni界面性质的影响。研究结果表明:影响Ag/Ni界面结合稳定性的主要原因是Ag(spd)与Ni(spd)轨道的杂化作用和Ag-Ni金属键的结合强度。在Ag/Ni界面掺杂Sn、W原子后,掺杂体系的分离功增加,界面能降低,利于界面结合强度的增强。Sn、W的掺杂加强了Ag、Ni原子轨道的杂化作用,还增加了Ni与Sn、Ag与W、Ni与W原子间的杂化轨道,促进Ni-Sn、Ag-W、Ni-W金属键的形成,从而提升界面结合的稳定性。

关 键 词:第一性原理  Ag/Ni界面  Sn、W掺杂  界面结合稳定性
收稿时间:2022-03-31
修稿时间:2022-05-22

Study on the interfacial bonding properties of Ag/Ni materials doped with Sn and W
JIA Jiying,WANG Jingqin and GUO Peijian. Study on the interfacial bonding properties of Ag/Ni materials doped with Sn and W[J]. Nonferrous Metals Engineering, 2022, 0(11)
Authors:JIA Jiying  WANG Jingqin  GUO Peijian
Affiliation:State Key Laboratory of Reliability and Intelligence of Electrical Equipment,Hebei University of Technology,State Key Laboratory of Reliability and Intelligence of Electrical Equipment,Hebei University of Technology,Tianjin Research Institute of Electric Science Co Ltd
Abstract:The Energy and electronic structure of Ag(110)/Ni(211) interface system are calculated and analyzed by first-principles pseudopotential method. The results show that the main factors affecting the bonding stability of Ag/Ni interface are the hybridization between s, p and d orbitals of Ag and s, p and d orbitals of Ni, and the bonding strength of Ag-Ni metal bond. When Sn and W atoms are doped at the Ag/Ni interface, the separation work of the doped system increases and the interfacial energy decreases, which is beneficial to the bonding strength of the Ag/Ni interface. Doping Sn and W can enhance the orbital hybridization between Ag and Ni, increase the hybrid orbitals between Ni and Sn, Ag and W, Ni and W atoms, and promote the formation of Ni-Sn, Ag-W, Ni-W metal bonds. Therefore, the interface bonding stability can be improved.
Keywords:first-principle   Ag/Ni interface   Sn, W doping   interfacial bonding stability
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