金刚石膜机械和机械-化学抛光

化学气相沉积(CVD)法生成的金刚石膜具有天然金刚石的基本性质，在机械、电子、光学等领域都有着广泛的应用。但CVD金刚石多晶膜表面凹凸不平，表面粗糙度较大，限制了它的广泛应用，因此，金刚石膜的抛光成为必不可少的工艺步骤。但是，金刚石膜的硬度非常高，且厚度薄，整体强度低，易破裂或剥落，抛光难度很大。国内外学者通过实验和研究，提出了多种金刚石膜抛光的理论和方法。本文详细论述了几种典型的机械、化学、机械-化学抛光方法的机理、工艺和特点。

Mechanical and Chemically-assisted Mechanical Polishing of CVD Diamond Film

People make synthetic diamond film using chemical vapor deposition (CVD). But polycrystalline CVD diamond films have rough and non-uniform thickness which can adversely affect their application. Polishing can be used to remedy these drawbacks. In recent years, many polishing techniques have been reported, each having technology advantages and disadvantages. This paper reviews the mechanical-chemical polishing of CVD diamond films. In the mechanical lapping, the final surface is controlled by the size of the abrasive powder used. In the chemical polishing, CVD diamond films is etched by molten rare earth metals such as lanthanum and cerium. The temperature of polishing plate, its material and the atmosphere during the polishing are very important to the final surface by thermo-chemical polishing. Chemically assisted mechanical polishing (CAMP) is a combination technique that uses mechanical polishing in conjunction with chemicals to enhance the remove rate. At last, we propose a new polishing technology for polishing CVD diamond film.