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溅射制备非晶氮化镓薄膜的光学性能
引用本文:潘孝军,张振兴,贾璐,李晖,谢二庆.溅射制备非晶氮化镓薄膜的光学性能[J].无机材料学报,2007,22(4):725-728.
作者姓名:潘孝军  张振兴  贾璐  李晖  谢二庆
作者单位:兰州大学物理科学与技术学院, 兰州 730000
摘    要:利用直流磁控溅射方法制备了GaN薄膜. X射线衍射及Raman光谱结果表明薄膜样品为非晶结构; 傅立叶红外光谱表明薄膜样品的主要吸收峰为Ga--N键的伸缩振动; 光致发光测试得到了360nm处的紫外发光谱; 测量薄膜样品的紫外-可 见谱, 并利用Tauc公式计算得到样品的光学带隙为3.74eV, 这与光致发光谱得到的结果是一致的.

关 键 词:非晶氮化镓  溅射制备  光学性能  
文章编号:1000-324X(2007)04-0725-04
收稿时间:2006-7-12
修稿时间:2006-07-12

Optical Properties of a-GaN Film Deposited by DC Magnetron Sputtering
PAN Xiao-Jun,ZHANG Zhen-Xing,JIA Lu,LI Hui,XIE Er-Qing.Optical Properties of a-GaN Film Deposited by DC Magnetron Sputtering[J].Journal of Inorganic Materials,2007,22(4):725-728.
Authors:PAN Xiao-Jun  ZHANG Zhen-Xing  JIA Lu  LI Hui  XIE Er-Qing
Affiliation:School of Physical Science and Technology, Lanzhou University, Lanzhou 730000, China
Abstract:GaN thin films were prepared by direct current (DC) planar magnetron sputtering on Si and SiO$_2$. The films were characterized by X-ray diffraction (XRD), Raman, Fourier Transform Infrared Spectroscopy (FTIR), photoluminescence (PL) and UV-Vis spectra. XRD and Raman spectrum show that the films are amorphous. Fourier infrared absorbance spectrum shows that the main absorbance is Ga-N stretching vibration. 360nm ultraviolet emission is obtained at room temperature. UV-Vis result shows that the optical band gap of the films is 3.74eV, which is consistent with photoluminescence spectrum result. \vspace*{.2cm
Keywords:amorphous GaN  DC sputtering  optical properties
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