| 热处理条件对溅射法制得的InSb薄膜特性的影响 |
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| 引用本文： | 关艳霞,孙承松,温作晓.热处理条件对溅射法制得的InSb薄膜特性的影响[J].仪表技术与传感器,2000(9):15-16. |
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| 作者姓名： | 关艳霞 孙承松 温作晓 |
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| 作者单位： | 沈阳工业大学信息学院 沈阳市 110023 |
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| 摘 要： | 文中从理论和实验分析了热处理条件对溅射法制得的ＩｎＳｂ薄膜特性的影响。热处理温度、时间和升降温速率都对薄膜特性有影响，通过实验得出了最佳的热处理温度、恒温时间和升降温速率。最后讨论了热处理过程中所采用的３种保护膜。
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| 关 键 词： | InSb薄膜 热处理 溅射制膜 霍尔输出特性 |
| 修稿时间： | 1999年11月5日 |
Annealing Effect of Sputtered lnSb Thin Films |
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| Guan YanXia Sun ChengsongWen Zuoxiao College of Information Engineering,Shenyang Technology University,Shenyang.Annealing Effect of Sputtered lnSb Thin Films[J].Instrument Technique and Sensor,2000(9):15-16. |
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| Authors: | Guan YanXia Sun ChengsongWen Zuoxiao College of Information Engineering Shenyang Technology University Shenyang |
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| Affiliation: | Guan YanXia Sun ChengsongWen Zuoxiao College of Information Engineering,Shenyang Technology University,Shenyang 110023 |
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| Abstract: | Annealing effect of sputtered InSb thin films is described in the paper .InSb thin films properties are affected by thermostatic temperature,time and the rate of heating-up and cooling.By experiments the best temperature,time and the rate of heating-up and cooling are given.At last 3 protecting films on the InSb used in annealing are discussed. |
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| Keywords: | InSb Thin film Annealing Technique |
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