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靶基距对射频磁控溅射法制备氟碳膜的结构与性能影响
引用本文:刘增机,纪全,张浴晖,夏延致,王凤军.靶基距对射频磁控溅射法制备氟碳膜的结构与性能影响[J].功能材料,2011,42(5):918-920.
作者姓名:刘增机  纪全  张浴晖  夏延致  王凤军
作者单位:刘增机,纪全,夏延致,王凤军,LIU Zeng-ji,JI Quan,XIA Yan-zhi,WANG Feng-jun(青岛大学,化工学院,山东,青岛,266071;青岛大学,纤维新材料与现代纺织国家重点实验室培育基地,山东,青岛,266071);张浴晖,ZHANG Yu-hui(青岛大学,化工学院,山东,青岛,266071)
摘    要:采用射频磁控溅射法,以聚四氟乙烯(PT-FE)为靶,氩气为载气,在再生纤维素基底上制备了氟碳膜.用原子力显微镜(AFM)、X射线光电子能谱(XPS)和静态接触角测试仪对氟碳膜的表面形貌、表面结构和表面性能进行了研究.结果表明,该法制得的氟碳膜是由纳米粒子组成的岛状结构,岛的表面起伏不平.这种氟碳膜由-CF3-CF2-、...

关 键 词:射频磁控溅射  靶基距  AFM  XPS  接触角

The study on structure and properties of fluorocarbon films prepared by RF magnetron sputtering at varying target-substrate distance
LIU Zeng-ji,JI Quan,ZHANG Yu-hui,XIA Yan-zhi,WANG Feng-jun.The study on structure and properties of fluorocarbon films prepared by RF magnetron sputtering at varying target-substrate distance[J].Journal of Functional Materials,2011,42(5):918-920.
Authors:LIU Zeng-ji  JI Quan  ZHANG Yu-hui  XIA Yan-zhi  WANG Feng-jun
Affiliation:LIU Zeng-ji1,2,JI Quan1,ZHANG Yu-hui1,XIA Yan-zhi1,WANG Feng-jun1,2(1.College of Chemical Engineering,Qingdao University,Qingdao 266071,China,2.State Key Laboratory Cultivating Base of Advanced Fiber Materials and Modern Textile,China)
Abstract:Fluorocarbon films were prepared by RF magnetron sputtering on regenerated cellulose substrate,used PTFE as the target and used Ar as the working gas.The atomic force microscope(AFM) was employed to determine the morphology of the surface.The structure of fluorocarbon films was investigated by means of XPS,and the contact angle was measured by the static contact angle testing apparatus.It was found that the obtained fluorocarbon films demonstrated islands-structure which were composed of nanosized particles...
Keywords:AFM  XPS
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