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| 脉冲激光沉积制备SnS薄膜及其光学特性的研究 | |
| 引用本文： | 李丽丽,梁齐,史成武,孔明光,李兵.脉冲激光沉积制备SnS薄膜及其光学特性的研究[J].真空科学与技术学报,2011,31(4):386-392. |
| 作者姓名： | 李丽丽 梁齐 史成武 孔明光 李兵 |
| 作者单位： | 1. 合肥工业大学电子科学与应用物理学院 合肥230009 2. 合肥工业大学化学工程学院 合肥230009 3. 中国科学院固体物理研究所材料物理重点实验室 合肥230031 |
| 基金项目： | 教育部留学归国人员实验室建设项目(新型微电子学薄膜研究室); 国家自然科学基金资助项目(51072043) |
| 摘 要： | 利用脉冲激光沉积法在玻璃衬底上制备SnS薄膜,研究了SnS薄膜的晶体结构、表面形貌以及有关光学特性。所制备的SnS薄膜样品为斜方晶系多晶结构,在(111)晶面上有很强的择优取向性;衬底温度在100~400℃范围内,表面形貌有所区别,随着温度升高,薄膜表面分别呈现大小晶粒共存、片状颗粒、针状颗粒和锥状颗粒的形貌特征;紫外区的SnS薄膜透过率极低,可见光范围的透过率很低,近红外区的透过率较大;样品在可见区和紫外区吸收强烈,吸收系数达105cm-1量级,直接禁带宽度为1.39~1.46 eV。 |
| 关 键 词： | SnS薄膜 脉冲激光沉积 表面形貌 透过率 |
Growth and Optical Properties of Pulsed Laser Deposited SnS Films |
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| Li Lili,Liang Qi,Shi Chengwu,Kong Mingguang,Li Bing.Growth and Optical Properties of Pulsed Laser Deposited SnS Films[J].JOurnal of Vacuum Science and Technology,2011,31(4):386-392. | |
| Authors: | Li Lili Liang Qi Shi Chengwu Kong Mingguang Li Bing |
| Affiliation: | Li Lili1,Liang Qi1,Shi Chengwu2,Kong Mingguang3,Li Bing2(1.School of Electronic Science and Applied Physics,Hefei University of Technology,Hefei 230009,China,2.School of Chemical Engineering,3.Key Lab of Mateials Physics,Institute of Solid State Physics,Chinese Academy of Sciences,Hefei 230031,China) |
| Abstract: | The SnS films were grown by pulsed laser deposition on glass substrates.The impacts of the growth conditions on its microstructures and optical properties were studied.Its microstructures and optical properties were characterized with X-ray diffraction,atomic force microscopy,and conventional optical probes.The results show that the orthorhombic polycrystalline phase with a preferential growth orientation in(111) dominated the SnS films,and that the substrate temperature strongly affects its surface morphol... |
| Keywords: | SnS thin film Pulsed laser deposition Morphology Transmittance |
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