| 氧氩流量比对ZnO薄膜的微结构及其发光特性的影响 |
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| 引用本文： | 汪小小,夏齐萍,吕建国,宋学萍,孙兆奇.氧氩流量比对ZnO薄膜的微结构及其发光特性的影响[J].真空科学与技术学报,2011,31(4):393-396. |
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| 作者姓名： | 汪小小 夏齐萍 吕建国 宋学萍 孙兆奇 |
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| 作者单位： | 1. 安徽大学物理与材料科学学院 合肥230039
2. 安徽大学物理与材料科学学院 合肥230039;合肥师范学院物理与电子工程系 合肥230061 |
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| 基金项目： | 国家自然科学基金(No.50872001,51072001); 教育部博士点专项基金(No.20060357003); 安徽省人才专项基金(No.2004Z029); 安徽高校省级自然科学研究重点项目(No.KJ2010A284) |
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| 摘 要： | 在室温下,利用射频磁控反应溅射法分别在硅片和石英玻璃上制备ZnO薄膜。通过控制O2/Ar流量比,研究O2/Ar流量比对ZnO薄膜的微结构、表面形貌及其光致发光特性的影响。X射线衍射仪和原子力显微镜结果显示,当O2/Ar流量比为3∶4时,所得薄膜结晶度最佳,表面粗糙度为0.725 nm;荧光光谱显示,ZnO薄膜在波长407 nm附近出现紫光发光峰,该发光峰源于氧空位浅施主能级到价带顶的电子跃迁,发射强度随O2/Ar流量比的增加先减小后增加。
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| 关 键 词： | ZnO薄膜 反应溅射 光致发光 氧氩流量比 |
Influence of O_2/Ar Flow Ratio on Microstructures and Photoluminescence of ZnO Films |
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| Wang Xiaoxiao,Xia Qiping,Lü Jianguo,Song Xueping,Sun Zhaoqi.Influence of O_2/Ar Flow Ratio on Microstructures and Photoluminescence of ZnO Films[J].JOurnal of Vacuum Science and Technology,2011,31(4):393-396. |
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| Authors: | Wang Xiaoxiao Xia Qiping Lü Jianguo Song Xueping Sun Zhaoqi |
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| Affiliation: | Wang Xiaoxiao1,Xia Qiping1,Lü Jianguo1,2,Song Xueping1,Sun Zhaoqi1(1.School of Physics & Material Science,Anhui University,Hefei 230039,China,2.Department of Physics & Electronic Engineering,Hefei Normal University,Hefei 230061,China) |
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| Abstract: | The ZnO films were deposited by reactive RF magnetron sputtering on Si and quartz substrates.The impacts of growth conditions,including the flow ratio of oxygen and argon,pressure,substrate temperature,and sputtering power,on ZnO film's quality were studied.Its microstructures and optical properties were characterized with X-ray diffraction,atomic force microscopy,and fluorescence spectroscopy.The results show that the ratio of oxygen and argon flow rate strongly affects the microstructures of the ZnO films... |
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| Keywords: | ZnO films Reactive sputtering Photoluminescence O2/Ar flow ratio |
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