| 基于遗传算法的真空磁控溅射射频阻抗匹配仿真研究 |
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| 引用本文： | 汪洪波,黄稳,陈长琦.基于遗传算法的真空磁控溅射射频阻抗匹配仿真研究[J].真空科学与技术学报,2011,31(4):500-504. |
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| 作者姓名： | 汪洪波 黄稳 陈长琦 |
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| 作者单位： | 合肥工业大学机械与汽车工程学院 合肥230009 |
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| 基金项目： | 合肥工业大学科学研究发展基金资助项目(2009HGXJ0087) |
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| 摘 要： | 针对真空磁控溅射射频电源阻抗匹配问题,设计射频L型阻抗匹配网络结构。在负载阻抗不同速率变化时,基于遗传算法优化反射系数指标,通过调节匹配网络中两个电容值以达到与射频源的阻抗匹配。大量仿真结果表明,遗传算法的阻抗匹配过程,反射系数能够很快地被调节到最佳值;即使负载阻抗产生较大突变,匹配网络亦能使反射系数快速恢复到最佳匹配点。匹配过程速度快、在最佳匹配点处反射系数波动小、匹配系统精度高。
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| 关 键 词： | 射频 阻抗匹配 遗传算法 仿真 |
Simulation of RF Impedance Matching of Magnetron Sputtering Based on Genetic Algorithm |
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| Wang Hongbo,Huang Wen,Chen Changqi.Simulation of RF Impedance Matching of Magnetron Sputtering Based on Genetic Algorithm[J].JOurnal of Vacuum Science and Technology,2011,31(4):500-504. |
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| Authors: | Wang Hongbo Huang Wen Chen Changqi |
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| Affiliation: | Wang Hongbo,Huang Wen,Chen Changqi(School of Mechanical and Automotive Engineering,Hefei University of Technology,Hefei 230009,China) |
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| Abstract: | The impedance matching of the radio-frequency(RF) power supply used in magnetron sputtering equipment was simulated based on genetic algorithm.A dedicated Ltype RF impedance matching network,the two capacitors of which,C1 and C2,can be automatically regulated to match the impedances of the power supply and the load,was designed,constructed and installed in the control unit of the magnetron sputtering equipment.The simulated results show that when the load impedance changes at different rates,especially at a... |
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| Keywords: | Radio-frequency Impedance matching Genetic algorithm Simulation |
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