| Abstract: | A new class of alkali-developable positive excimer laser (KrF) resists is described. Novel α-diazoacetoacetates derived from aliphatic polyfunctional alcohols were synthesized. These compounds undergo photolysis upon deep UV exposure to yield carboxylic acids, and exhibit excellent bleaching effects. Some of them, especially those having steroid skeletons, act as effective dissolution inhibitors. The composites prepared from these compounds and poly(p-hydroxybenzylsilsesquioxane) were used as alkali-developable positive deep UV resists, whose sensitivities depend on the number of photoactive groups in one photoactive molecule. Imaging results of KrF excimer laser projection printing are presented. |
