Modeling of the body current in a Bi-MOS hybrid-mode environment |
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Authors: | K S Yeo S H L Seah J G Ma M A Do |
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Affiliation: | Division of Circuits and Systems, School of Electrical and Electronic Engineering, Nanyang Technological University, Nanyang Avenue, Singapore 639798, Singapore |
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Abstract: | The body current IB of deep submicron lightly doped drain pMOSFETs has been investigated. Based on the experimental results, an analytical IB model, applicable for devices operating in a Bi-MOS hybrid-mode environment, has been developed for the first time. The proposed model is able to effectively characterize the measured IB results over a wide range of independently applied biases (gate, drain and body) and gate lengths (from 1 μm down to 0.25 μm). The possibility of minimizing or even eliminating the undesired IB is also explored and discussed for the first time. |
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Keywords: | Device modeling Impact ionization Deep submicron LDD MOSFETs |
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