| 线形微波等离子体CVD金刚石薄膜沉积技术 |
| |
| 引用本文： | 唐伟忠,蒋开云,耿春雷,黑立富. 线形微波等离子体CVD金刚石薄膜沉积技术[J]. 真空科学与技术学报, 2006, 26(3): 251-254 |
| |
| 作者姓名： | 唐伟忠 蒋开云 耿春雷 黑立富 |
| |
| 作者单位： | 北京科技大学材料科学与工程学院,北京,100083 |
| |
| 摘 要： | 本文将讨论一种新型的微波等离子体CVD设备———线形微波等离子体CVD设备和其在金刚石薄膜制备技术中的应用。利用Langmuir探针方法对线形微波等离子体CVD设备产生的H2等离子体进行的等离子体参数测量表明,在工频半波激励的条件下,H2等离子体的电子温度和等离子体密度分别约为6 eV和1×1010/cm3。尝试利用线形微波等离子体CVD设备,在直径为0.5 mm的小尺寸硬质合金微型钻头上进行了金刚石涂层的沉积,获得了质量良好的金刚石涂层。由于线形微波等离子体CVD设备产生的等离子体面积具有容易扩大的优点,因而在需要使用较大面积等离子体的场合,它将有着很好的应用前景。
|
| 关 键 词： | 线形微波等离子体 化学气相淀积 金刚石薄膜 |
| 文章编号： | 1672-7126（2006）03-0251-04 |
| 收稿时间： | 2005-12-13 |
| 修稿时间： | 2005-12-13 |
Development of Linear Extended Microwave Plasma Chemical Vapor Deposition for Diamond Film Growth |
| |
| Tang Weizhong,Jiang Kaiyun,Geng Chunlei,Hei Lifu. Development of Linear Extended Microwave Plasma Chemical Vapor Deposition for Diamond Film Growth[J]. JOurnal of Vacuum Science and Technology, 2006, 26(3): 251-254 |
| |
| Authors: | Tang Weizhong Jiang Kaiyun Geng Chunlei Hei Lifu |
| |
| Abstract: | A novel technique,called Linear Extended Microwave Plasma Chemical Vapor Deposition(CVD),was developed to grow diamond films.Langmuir probe was used to diagnose the H_2 plasma generated by our home-made apparatus dedicated to this new technique.High quality diamond films were also grown on a cemented carbide microdrill,0.5 mm in diameter,to exemplify the technique.Since the plasma so generated can cover large areas,its industrial applications were also discussed. |
| |
| Keywords: | Linear extended microwave plasma Chemical vapor deposition Diamond film |
| 本文献已被 CNKI 万方数据 等数据库收录！ |
|
