Perpendicular Magnetic Anisotropy in FePt Patterned Media Employing a CrV Seed Layer |
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Authors: | Hyunsu Kim Jin-Seo Noh Jong Wook Roh Dong Won Chun Sungman Kim Sang Hyun Jung Ho Kwan Kang Won Yong Jeong Wooyoung Lee |
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Affiliation: | (1) Department of Materials Science and Engineering, Yonsei University, Seoul, 120-749, Korea;(2) Korea Institute of Science and Technology (KIST), Seongbuk-gu, Seoul, 136-761, Korea;(3) Nano Process Division, Korea Advanced Nano Fab. Center, Gyeonggi, 443-270, Korea; |
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Abstract: | A thin FePt film was deposited onto a CrV seed layer at 400°C and showed a high coercivity (~3,400 Oe) and high magnetization
(900–1,000 emu/cm3) characteristic of L10 phase. However, the magnetic properties of patterned media fabricated from the film stack were degraded due to the Ar-ion
bombardment. We employed a deposition-last process, in which FePt film deposited at room temperature underwent lift-off and
post-annealing processes, to avoid the exposure of FePt to Ar plasma. A patterned medium with 100-nm nano-columns showed an
out-of-plane coercivity fivefold larger than its in-plane counterpart and a remanent magnetization comparable to saturation
magnetization in the out-of-plane direction, indicating a high perpendicular anisotropy. These results demonstrate the high
perpendicular anisotropy in FePt patterned media using a Cr-based compound seed layer for the first time and suggest that
ultra-high-density magnetic recording media can be achieved using this optimized top-down approach. |
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Keywords: | FePt CrV underlayer Patterned media E-beam lithography |
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