| Abstract: | Hard alloy were implanted with a dual-ion of nitrogen and tantalum at temperature of 100 ℃ and 400 ℃ at a dose of 8× 1017 ions cm-2 .Auger electron spectroscopy (AES) was used to determine the nitrogen and tantalum concentration profiles. Microhardness measurements were performed to evaluate the improvements in surface property. The thickness of implanted layers increased by about an order of magnitude when the temperature was elevated from 100 ℃ to 400 ℃. A higher surface hardness was also obtained in the higher temperature implantation. Scanning electron microscopy (SEM) image showed distinct microstructural changes, and X-ray diffraction (XRD) analysis showed the presence of nitrides of tantalum and tungsten on the surface implanted. |
