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Laser irradiation of oligosiloxane copolymer thin films functionalized with side chain bulky carbosilane moieties
Authors:Anna Kowalewska  Jaroslav Kupcik  W?odzimierz A. Stańczyk
Affiliation:a Centre of Molecular and Macromolecular Studies, Polish Academy of Sciences, Sienkiewicza 112, 90-363 ?ód?, Poland
b Institute of Chemical Process Fundamentals, Academy of Sciences of the Czech Republic, Rozvojova 2, CZ-165 02 Prague 6 - Suchdol, Czech Republic
Abstract:Linear oligosiloxanes functionalized with bulky side chain tris(trimethylsilyl)hexyl (TTSH) substituents were transformed into cross-linked materials by UV 193 nm excimer pulsed laser ablation. The process occurred without any catalyst, by reactions of radicals formed in UV laser induced photolysis of side tris(trimethylsilyl)hexyl groups. Chemical changes were monitored by FTIR, LC/UV, GC/MS and solubility tests.
Keywords:UV laser ablation   Siloxane   Tris(trimethylsilyl)methane
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