Preparation of epitaxial YBa2Cu3O7−x films by magnetron sputtering |
| |
Authors: | I M Kotelyansky V B Kravchenko V A Luzanov A T Sobolev |
| |
Affiliation: | (1) Institute of Radioengineering and Electronics, USSR Academy of Sciences, K. Marx av. 18, 103907 Moscow, USSR |
| |
Abstract: | Thin films of highT c superconductor YBa2Cu3O7−x were obtained by magnetron sputtering. MgO, YSZ, YSH and Al2O3 single crystals were used as substrates. Epitaxial films with tetragonal structure havingT c 55–60 K grow at substrate temperaturesT s between 930 K and 980 K. Orientation of the films in thisT s range was (100) and (001) for (100) MgO substrate, (111) and (001) for (1012) Al2O3 and (111) YSH and (113) or (103) on (110) YSZ and (111) YSH. Single crystalline films with orthorhombic structure and (001) orientation were grown on all the substrates whenT s exceeded 980 K. They haveT c>80 K. |
| |
Keywords: | HighT c superconductor YBa2Cu3O7− x films magnetron sputtering |
本文献已被 SpringerLink 等数据库收录! |