| 铬及铍表面辉光放电清洗的研究 |
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| 引用本文： | 田喜庆,黄天斌,陈旭. 铬及铍表面辉光放电清洗的研究[J]. 真空, 2006, 43(5): 39-42 |
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| 作者姓名： | 田喜庆 黄天斌 陈旭 |
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| 作者单位： | 清华大学电子工程系,北京,100084 |
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| 摘 要： | 本文对He辉光放电清洗后的铬（Cr）表面杂质去除情况和铍（Be）样品真空出气量变化进行了实验研究。使用场发射扫描电镜和表面质量测量仪对比观察了不同放电参数处理后的Cr样品表面，结果显示在放电功率为200～300W、放电室压强为1～10Pa、清洗时间为10-20min时可较好地清除表面杂质和降低表面粗糙度；对辉光放电处理前后Be样品出气情况的实验对比结果显示，清洗后1h内总出气量约降为清洗前的1／6。
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| 关 键 词： | 辉光放电清洗 表面粗糙度 出气率 |
| 文章编号： | 1002-0322（2006）05-0039-04 |
| 收稿时间： | 2006-02-08 |
| 修稿时间： | 2006-02-08 |
Investigation on glow discharge cleaning for surfaces of chromium and beryllium |
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| TIAN Xi-qing,HUANG Tian-bin,CHEN Xu. Investigation on glow discharge cleaning for surfaces of chromium and beryllium[J]. Vacuum(China), 2006, 43(5): 39-42 |
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| Authors: | TIAN Xi-qing HUANG Tian-bin CHEN Xu |
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| Affiliation: | Dept. of Electronic Engineering, Tsinghua University, Beijing 100084, China |
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| Abstract: | Investigates experimentally the effect of helium glow discharge cleaning(GDC)on the impuritiy removal from chromium(Cr)surface and the outgassing variation of beryllium(Be).Cr surfaces treated in different processes have been analyzed by scanning electron microscope(SEM)and untouched 3D surface morphology analyzer,and the results showed that less surface impurities and low roughness are available under conditions of 200~300W power excitation,1~10Pa pressure environment and 10~20min process duration.It reveals that the total outgassing amount in 1 hour decreases to about its 1/6 after GDC by comparing the outgassing rates of Be samples before and after GDC. |
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| Keywords: | glow discharge cleaning surface roughness outgassing rate |
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