色散效应对钝化硅太阳电池减反射膜系设计的影响

在考虑折射率色散效应基础上，以加权平均反射率作为评价函数，通过智能优化算法对空间硅太阳电池减反射膜进行优化设计，得到了最佳的膜厚参数，并与不考虑色散下设计的减反射膜进行了比较。对MgF2/TiO2，SiO2/TiO2双层减反射膜，与不考虑色散情形相比，考虑色散下优化后的最小加权平均反射率分别减小了36.6%和37.6%；对具有厚度为15 nm的SiO2钝化层的硅太阳电池的MgF2/TiO2，SiO2/TiO2减反射膜重新优化设计，与不考虑色散情形相比，考虑色散下优化后的最小加权平均反射率分别减小了43.9%和33.7%；对具有不同厚度钝化层的空间硅太阳电池，在考虑色散下进行了减反射膜的优化设计。结果发现，随着钝化层厚度的增加，所得减反射膜的最小加权平均反射率也随之增大，减反射效果越来越弱。最后，在考虑与未考虑色散情形下，将钝化层膜厚也作为反演参量后重新设计。结果表明:在色散情形下所设计的减反射膜更佳，对于MgF2/TiO2/SiO2（钝化层）膜系，最佳膜厚参量为d1（MgF2）=97.6 nm，d2（TiO2）=40.2 nm，d3（SiO2）=4.9 nm；对于SiO2/TiO2/SiO2（钝化层），最佳膜厚参量为d1（SiO2）=85.1 nm，d2（TiO2）=43.4 nm，d3（SiO2）=1.8 nm。

Dispersion effect on optimized design of anti-reflection coatings for passivated silicon solar cells dispersion

Based on the refractive index dispersion effect, the weighted average reflectivity was used as evaluation function, and the best film thickness parameters of the anti-reflection coatings for the space silicon solar cell was obtained by the intelligent optimization algorithm. The optimization results were compared with that of the anti-reflection coatings designed without considering the dispersion. It displayed that after optimizing, the minimal weighted average reflectivity of the MgF2/TiO2 and SiO2/TiO2 anti-reflection coatings were reduced by 36.6% and 37.6% under considering the dispersion effect than that without considering dispersion effect. And then the MgF2/TiO2 and SiO2/TiO2 anti-reflection coatings were deposited on the silicon solar cells with a thickness of 15 nm SiO2 passivation layer and optimized again. Comparing without considering dispersion effect, the minimal weighted average reflectivity in the case of dispersion was reduced by 43.9% and 33.7% for the MgF2/TiO2 and SiO2/TiO2 coatings with passivation layer, respectively. The optimal design of the anti-reflection coatings were carried out for the space silicon solar cells with different thickness passivation layer. It was found that the minimum weighted average reflectivity of the anti-reflection coatings increased with the increase of the thickness of the passivation layer, meaning that the anti-reflection effect got weaker and weaker. Finally, the anti-reflection coatings were redesigned when the thickness of the passivation layer was also considered as an inversion parameter considering the refractive-index dispersion effect or not. The results show that the anti-reflection film is more optimization by considering the dispersion. For the MgF2/TiO2/SiO2(passivation layer) film system, the optimal film thickness parameters are d1(MgF2)=97.6 nm, d2(TiO2)=40.2 nm, d3(SiO2)=4.9 nm. For the SiO2/TiO2/SiO2(passivation layer) film system, the optimal film thickness parameters are d1(SiO2)=85.1 nm, d2(TiO2)=43.4 nm, d3(SiO2)=1.8 nm.