SU-8环氧树脂的分离实验研究

为分析和解决商业用SU-8胶在355 nm波长的吸收性和后烘缩胶等问题,先采用柱层析对SU-8环氧树脂进行分离,然后进一步用高压液相色谱-尺寸排阻色谱法对SU-8环氧树脂进行分离和分析。结果表明,SU-8环氧树脂包括SU-1,SU-2,SU-4,SU-6和SU-8多种组分及其它杂质,分子量分布在100-100 000的范围。根据分析结果,研究了上述问题出现的原因,并配制了性能优化的SU-8光刻胶,结合全息光刻技术制作了三维光子晶体。

Experimental Study on Separation of Epon SU-8

For analysis and solution the problems of absorbency of the commercial Epon SU8 photoresist at 355 nm and its post-bake shrink,Epon SU-8 was firstly separated using the column chromatography,and then it was further separated and analyzed by high pressure liquid chromatography and size exclusion chromatography.The results indicate that Epon SU-8 includes SU-1,SU-2,SU-4,SU-6,and SU8 components and other impurities,and their molecular weight describes in a range of 100-100 000.After the reason which the above problems appear was studied by the analysis results,a SU-8 photoresist with excellent properties was made and it was used to fabricate the 3-D photonic crystals together with holographic lithography.