| 显影关键点及其对精细线路制作的影响 |
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| 引用本文： | 田玲,李志东. 显影关键点及其对精细线路制作的影响[J]. 印制电路信息, 2009, 0(5): 30-33 |
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| 作者姓名： | 田玲 李志东 |
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| 作者单位： | 广州市兴森电子有限公司,广东,广州,510730 |
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| 摘 要： | 文章结合过显侵蚀干膜的原理，试验设计不同的显影条件，分析干膜线路和蚀刻线路的情况，确定显影关键点及其对精细线路制作的影响。
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| 关 键 词： | 显影 显影（像）点 干膜 精细线路 |
The Critical Point of Developing and It's Impact on Fine Line's Manufacture |
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| TIAN Lin,LI Zhi-dong. The Critical Point of Developing and It's Impact on Fine Line's Manufacture[J]. Printed Circuit Information, 2009, 0(5): 30-33 |
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| Authors: | TIAN Lin LI Zhi-dong |
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| Affiliation: | TIAN Lin LI Zhi-dong |
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| Abstract: | This article based on the theory of over-development attacking the exposed dry film,designs a series of experiments with different developing parameter, through the analysis of the circumstance of developed dry film line and etched line,confirms the critical factor of development and it＇s influence on fine line＇s facture. |
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| Keywords: | development break point dry film fine line |
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