磁控溅射制备金属铀膜

研究了通过磁控溅射方法制备高纯金属铀膜的可行性。采用X射线衍射（XRD）、俄歇电子能谱（AES）、扫描电镜（SEM）、表面轮廓仪分析了沉积在单晶硅或金基材上铀薄膜的微观结构、成分、界面结构及厚度、表面形貌和表面粗糙度。分析结果表明：磁控溅射制备的铀薄膜为纯金属态，氧含量和其它杂质含量均低于俄歇电子能谱仪的探测下限；溅射沉积的铀镀层与铝镀层之间存在界面作用，两者相互扩散并形成合金相，扩散层厚度约为10nm。铀薄膜厚度可达微米级，表面光洁，均方根（RMS）粗糙度优于15nm。

Preparation of Metal Uranium Films by Magnetron Sputtering

Feasibility of preparation of high-purity metal uranium films by magnetron sputtering deposition was studied. Microstructure, composition, interface of U/Al and surface morphology were analyzed by X-ray diffraction (XRD), Auger electron spectroscopy (AES) and scanning electron microscopy (SEM). It shows that uranium films prepared by magnetron sputtering deposition are purity metal states. Oxygen and other impurity elements in the uranium films are below the detection limit of Auger electron spectroscopy. There is interdiffusion action at U/Al interface to formed UAl_x alloys. Depth of interdiffusion interface is about 10 nm. Root-mean-square (RMS) surface roughness of uranium films is fine than 15 nm.