Characterization of highly doped n- and p-type 6H-SiCpiezoresistors |
| |
Authors: | Okojie RS Ned AA Kurtz AD Carr WN |
| |
Affiliation: | Kulite Semicond. Products Inc., Leonia, NJ; |
| |
Abstract: | Highly doped (~2×1019 cm-3) n- and p-type 6H-SiC strain sensing mesa resistors configured in Wheatstone bridge integrated beam transducers were investigated to characterize the piezoresistive and electrical properties. Longitudinal and transverse gauge factors, temperature dependence of resistance, gauge factor (GF), and bridge output voltage were evaluated. For the n-type net doping level of 2×1019 cm-3 the bridge gauge factor was found to be 15 at room temperature and 8 at 250°C. For this doping level, a TCR of -0.24%/°C and -0.74%/°C at 100°C was obtained for the n- and p-type, respectively. At 250°C, the TCR was -0.14%/°C and -0.34%/°C, respectively. In both types, for the given doping level, impurity scattering is implied to be the dominant scattering mechanism. The results from this investigation further strengthen the viability of 6H-SiC as a piezoresistive pressure sensor for high-temperature applications |
| |
Keywords: | |
|
|