首页 | 本学科首页   官方微博 | 高级检索  
     

化学溶液沉积法La2CuMnO6缓冲层薄膜的制备与结构表征
引用本文:马高峰,雷宁,张国防,卢亚峰,郗大来,白宏斌,王炳旭,冯宝奇.化学溶液沉积法La2CuMnO6缓冲层薄膜的制备与结构表征[J].材料导报,2011,25(4):67-69,73.
作者姓名:马高峰  雷宁  张国防  卢亚峰  郗大来  白宏斌  王炳旭  冯宝奇
作者单位:1. 西部鑫兴金属材料有限公司,洛南,726100
2. 陕西师范大学化学与材料科学学院,应用表面与胶体化学教育部重点实验室,西安710062
3. 西北有色金属研究院,西安,710016
基金项目:国家863计划项目(2006AA03Z204)
摘    要:根据镧、铜及锰盐在不同溶剂中的溶解性,选择合适的溶剂及镧、铜及锰盐为前驱体,配制成前驱溶液进行润湿性、稳定性及不同衬底热处理实验,成功筛选出制备La2CuMnO6(LCMO)缓冲层薄膜的前驱体,利用X射线衍射(XRD)和原子力显微镜(AFM)对化学溶液沉积法(CSD)合成的La2CuMnO6薄膜的相组成和形貌结构进行了表征。结果表明,选择合适的前驱体(La(CH3COO)3·1.5H2O、Cu(CH3COO)2·1.0H2O、Mn(CH3COO)2·4.0H2O)及SrTiO3(STO)(100)衬底,在1000℃、保温时间3h、空气气氛及总离子浓度为1.0mol/L工艺条件下制备的La2CuMnO6薄膜具有很好的c轴织构,薄膜表面较平整、均匀、无裂纹、无孔洞,分布均匀且排列致密,完全满足缓冲层对薄膜的要求。

关 键 词:化学溶液沉积法  La2CuMnO6  前驱体金属盐  衬底  筛选  缓冲层薄膜  制备  结构表征

Preparation and Structural Characterization of La_2CuMnO_6 Films Buffer Layer by Chemical Solution Deposition
MA Gaofeng,LEI Ning,ZHANG Guofang,LU Yafeng,XI Dalai,BAI Hongbin,WANG Bingxu,FENG Baoqi.Preparation and Structural Characterization of La_2CuMnO_6 Films Buffer Layer by Chemical Solution Deposition[J].Materials Review,2011,25(4):67-69,73.
Authors:MA Gaofeng  LEI Ning  ZHANG Guofang  LU Yafeng  XI Dalai  BAI Hongbin  WANG Bingxu  FENG Baoqi
Affiliation:MA Gaofeng1,LEI Ning1,ZHANG Guofang2,LU Yafeng3,XI Dalai1,BAI Hongbin1,WANG Bingxu1,FENG Baoqi1(1 Western Xin Xing Metal Materials Co.,Ltd,Luonan 726100,2 Key Laboratory of Applied Surface and Colloid Chemistry ofMinistry of Education,School of Chemistry & Materials Science,Shaanxi Normal University,Xi'an 710062,3 Northwest Institute for Nonferrous Metal Research,Xi'an 710016)
Abstract:The solubility of lanthanum,copper and manganese salts in different solvents was investigated,the appropriate solvent was selected.With lanthanum,copper and manganese salts as precursors,the wettability,stability and different substrate heat treatment were tested.The optimum precursor and substrate for the preparation of La2CuMnO6(LCMO) films buffer layer were successfully screened out.The phase composition and morphology of La2CuMnO6 film prepared by he chemical solution deposition(CSD) method were charact...
Keywords:chemical solution deposition  La2CuMnO6  precursor metal salt  substrate  selection  buffer layer thin films  preparation  structure characterization  
本文献已被 CNKI 万方数据 等数据库收录!
设为首页 | 免责声明 | 关于勤云 | 加入收藏

Copyright©北京勤云科技发展有限公司  京ICP备09084417号