| 离子束刻蚀双频光栅的实验研究 |
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| 引用本文： | 付绍军,洪义麟,陶晓明,苏永刚,明海,谢建平.离子束刻蚀双频光栅的实验研究[J].量子电子学报,1992(2). |
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| 作者姓名： | 付绍军 洪义麟 陶晓明 苏永刚 明海 谢建平 |
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| 作者单位： | 中国科技大学国家同步辐射实验室，中国科技大学国家同步辐射实验室，中国科技大学国家同步辐射实验室，中国科技大学国家同步辐射实验室，中国科技大学物理系，中国科技大学物理系 合肥，230026，合肥，230026，合肥，230026，合肥，230026，合肥，230026，合肥，230026 |
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| 摘 要： | 本文利用离子束在玻璃上刻蚀出双频光栅,研究了光栅掩模制作中曝光量和显影条件,离子束刻蚀工艺等因素对光栅衍射效率的影响,并给出一些实验结果。
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| 关 键 词： | 离子束刻蚀 全息术 双频光栅 |
Experimental Research of Double Frequency Grating with Ion Beam Etching Technique |
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| Fu Shaojun,Hong Yilin,Tao Xiaoming,Su Yonggang,Ming Hai,Xie Jianping National Synchrotron Radiation Laboratory,University of Science and Technology of China,Hefei.Experimental Research of Double Frequency Grating with Ion Beam Etching Technique[J].Chinese Journal of Quantum Electronics,1992(2). |
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| Authors: | Fu Shaojun Hong Yilin Tao Xiaoming Su Yonggang Ming Hai Xie Jianping National Synchrotron Radiation Laboratory University of Science and Technology of China Hefei |
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| Affiliation: | Fu Shaojun,Hong Yilin,Tao Xiaoming,Su Yonggang,Ming Hai,Xie Jianping National Synchrotron Radiation Laboratory,University of Science and Technology of China,Hefei,230026 Department of Physics,University of Science and Technology of China,Hefei,230026 |
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| Abstract: | In this paper the double frequency grating is fabricated on the glass by ionbeam etching technique. The exposure and development conditions for making gra-ting mask are researched. The influence of ion beam etching process on diffra-ction efficiency of grating is discussed and the experimental results are alsogiven. |
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| Keywords: | ion beam etching holography double frequency grating |
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