Formation of structure of the CdTe film, recrystallized on Mo/glass substrate under high temperature and mechanical pressure |
| |
Authors: | V. Mikli J. Hiie M. Viljus U. Kallavus |
| |
Affiliation: | a Centre for Materials Research, Tallinn University of Technology, Ehitajate tee 5, 19086 Tallinn, Estonia b Institute of Materials Science, Tallinn University of Technology, Ehitajate tee 5, 19086 Tallinn, Estonia |
| |
Abstract: | Large-grained and 7 μm thick CdTe film has been fabricated on top of Mo coated soda-lime glass substrate. As a new approach the dynamic recrystallization process (DRC) was used to form the structure of films. For the characterization of the structure and composition of the films a scanning electron microscopy (SEM), energy dispersive X-ray microanalysis (EDS) and X-ray diffraction (XRD) methods were used. The changes in the structure of films were studied in accordance with the process temperature, pressure and as-deposited film thickness. Significant changes in the CdTe film were observed after DRC of deposited films at the process temperatures between 450 °C and 550 °C. EDS quantitative analysis showed that during the recrystallization the Mo and CdTe films composition remained stable for all studied samples. The XRD results showed that the increase in the process temperature caused improvement in orientation of the films along direction of (111). The DRC temperature above 550 °C reduced the orientation again. The limits of the temperature and pressure in application of soda-lime glass in DRC were found and discussed. |
| |
Keywords: | CdTe Thin film Dynamic recrystallization Temperature gradient Mo-glass |
本文献已被 ScienceDirect 等数据库收录! |
|