Atomic layer deposition of iron(III) oxide on zirconia nanoparticles in a fluidized bed reactor using ferrocene and oxygen |
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Authors: | Jonathan R. Scheffe David M. King Brittany A. Branch Steven M. George Alan W. Weimer |
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Affiliation: | a Department of Chemical and Biological Engineering, University of Colorado, Boulder, CO 80309, USA b Department of Chemistry and Biochemistry, University of Colorado, Boulder, CO 80309, USA c Department of Chemical Engineering, Tecnológico de Monterrey, Mexico |
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Abstract: | Conformal films of amorphous iron(III) oxide and α-Fe2O3 have been coated on zirconia nanoparticles (26 nm) in a fluidized bed reactor by atomic layer deposition. Ferrocene and oxygen were alternately dosed into the reactor at temperatures between 367 °C and 534 °C. Self-limiting chemistry was observed via in situ mass spectrometry, and by means of induced coupled plasma-atomic emission spectroscopy analysis. Film conformality and uniformity were verified by high resolution transmission electron microscopy, and the growth rate was determined to be 0.15 Å per cycle. Energy dispersive spectroscopy, X-ray diffractometry, and X-ray photoelectron spectroscopy were utilized as a means to determine film composition at each deposition temperature. Over all of the deposition temperatures investigated, films were deposited as amorphous iron(III) oxide. However, after heat treatment at 850 °C in air and N2 atmospheres, α-Fe2O3 was the predominant species. |
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Keywords: | Atomic layer deposition (ALD) Iron oxide Ferrocene Nanoparticles Thin film |
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