|
|||||
|
|
Fabrication of TiO2-based transparent conducting oxide on glass and polyimide substrates |
|
| Authors: | T Hitosugi N Yamada J Kasai T Shimada T Hasegawa |
| Affiliation: | a Advanced Institute for Materials Research (WPI-AIMR), Tohoku University, Sendai, Japan b Kanagawa Academy of Science and Technology (KAST), Kanagawa, Japan c Department of Chemistry, University of Tokyo, Tokyo, Japan |
| Abstract: | We report on preparation and properties of anatase Nb-doped TiO2 transparent conducting oxide films on glass and polyimide substrates. Amorphous Ti0.96Nb0.04O2 films were deposited at room temperature by using sputtering, and were then crystallized through annealing under reducing atmosphere. Use of a seed layer substantially improved the crystallinity and resistivity (ρ) of the films. We attained ρ = 9.2 × 10− 4 Ω cm and transmittance of ~ 70% in the visible region on glass by annealing at 300 °C in vacuum. The minimum ρ of 7.0 × 10− 4 Ω cm was obtained by 400 °C annealing in pure H2. |
| Keywords: | Titanium oxide Transparent conducting oxide Sputtering Titanium dioxide |
| 本文献已被 ScienceDirect 等数据库收录！ | |