Low temperature decomposition of large molecules of TMA using catalyzers with resistance to oxidation in catalytic CVD |
| |
Authors: | Yoh-Ichiro Ogita Tugutomo Kudoh Ryohei Iwai |
| |
Affiliation: | Kanagawa Institute of Technology, 1030 Shimo-Ogino, Atsugi, Kanagawa, 243-0292, Japan |
| |
Abstract: | In order to obtain catalyzers to decompose tri-methyl aluminium (TMA) to Al and CH3 at catalyzer temperatures lower than 500 °C, decomposition experiments using Ni-Chrome, Kanthal, Inconel 600, Chromel and SUS-304 catalyzers exhibiting resistance to oxidation have been carried out. The experiments have revealed that TMA can be decomposed to Al and CH3 above 200 °C using Chromel or SUS-304 catalyzer, and that the CH3 does not decompose further below 500 °C. The experiments have also revealed that it requires relatively small activation energy for decomposing TMA to Al and CH3 using Chromel or SUS-304 as the catalyzer. |
| |
Keywords: | Al2O3 films Catalytic CVD HW-CVD Activation energy Catalyzers Oxide films |
本文献已被 ScienceDirect 等数据库收录! |
|