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Electrochemical behaviour of copper in neutral aerated chloride solution. II. Impedance investigation
Authors:Claude Deslouis  Bernard Tribollet  Guiliano Mengoli  Marco M. Musiani
Affiliation:(1) LP 15 du CNRS "lsquo"Physique des Liquides et Electrochimie"rsquo", associé à l'Université Pierre et Marie Curie, 4 place Jussieu, 75252 Paris Cedex 05, France;(2) Istituto di Polarografia ed Elettrochimica Preparativa del CNR, Corso Stati Uniti, 4. 35100 Padova, Italy
Abstract:A.c. and EHD impedance measurements were performed on a Cu rotating disc electrode immersed in neutral aerated NaCl and the results were compared with simulated curves according to the kinetic model developed in Part I. The agreement is good over the whole anodic range and at the corrosion potential. A slowing down of the mass transport rate is explained by diffusion through a surface layer (Cu2O) at the corrosion potential and for the close anodic range. It is confirmed that, on the cathodic plateau, the interface may be considered as uniformly accessible for the cathodic partial reaction of oxygen reduction. However, at less cathodic potential a surface layer effect due to CuCl must also be taken into account. Diffusion coefficients for both O2 and CuCl2 were determined by EHD impedance.
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