Dielectric response and structure of amorphous hydrogenated carbon films with nitrogen admixture |
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Authors: | Lenka Zají ?ková ,Daniel FrantaDavid Ne?as,Vilma Bur&scaron í ková Mihai Muresan,Vratislav Pe?inaChristoph Cobet |
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Affiliation: | a Department of Physical Electronics, Faculty of Science, Masaryk University, Kotlá?ská 2, 611 37 Brno, Czech Republicb Institute of Nuclear Physics, Academy of Science of the Czech Republic, ?e?, Czech Republicc Institute for Analytical Sciences, Albert-Einstein-Str. 9, 12489 Berlin, Germany |
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Abstract: | The optical properties and structure of a-C:H films were modified by addition of nitrogen into the CH4/H2 deposition mixture. Three films prepared in capacitively coupled rf discharge were compared: (a) hydrogenated diamond like carbon film with hydrogen content of 34% and indentation hardness of 21.7 GPa, (b) hard a-C:H:N film with nitrogen content of 13% and indentation hardness of 18.5 GPa and (c) soft a-C:H:N film with nitrogen content of 10% and indentation hardness of 6.7 GPa. It is shown how the parametrized density of states model describing dielectric response of electronic interband transitions can be applied to modified a-C:H:N and how it can be combined with correct treatment of transmittance measured in infrared range using additional Gaussian peaks in joint density of phonon states. This analysis resulted in determination of film dielectric function in wide spectral range (0.045-30 eV) and provided also information about the density of states of valence and conduction bands and lattice vibrations. |
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Keywords: | Diamond-like carbon Amorphous hydrogenated carbon Optical properties Band structure |
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