| 铜电解槽发展概况 |
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| 引用本文： | 张鹏,刘秀,邓攀,陈涛.铜电解槽发展概况[J].山西冶金,2012(4):1-3. |
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| 作者姓名： | 张鹏 刘秀 邓攀 陈涛 |
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| 作者单位： | 江西理工大学 |
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| 摘 要： | 介绍了各类铜电解槽的发展过程,对它们的优缺点进行了比较,提出了今后铜电解槽发展趋势及方向。
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| 关 键 词： | 铜电解槽 内衬 防腐蚀 |
Development of Electrolytic Cell for Copper |
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| ZHANG Peng,LIU Xiu,DENG Pan,CHEN Tao.Development of Electrolytic Cell for Copper[J].Shanxi Metallurgy,2012(4):1-3. |
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| Authors: | ZHANG Peng LIU Xiu DENG Pan CHEN Tao |
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| Affiliation: | (JiangXi University of Science and Technology,GanZhou 341000,China) |
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| Abstract: | This paper introduce the development of Various types electrolytic cell for copper,The advantages and disadvantages of them were compared,and put forward the development trend and direction of electrolysis cell for copper. |
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| Keywords: | copper electrolytic cell lined anti-corrosion |
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