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钢表面化学气相沉积TiC晶体的择优取向
引用本文:郭成言,後藤孝,平井敏雄.钢表面化学气相沉积TiC晶体的择优取向[J].金属学报,1992,28(7):85-89.
作者姓名:郭成言  後藤孝  平井敏雄
作者单位:吉林工学院材料工程系,日本东北大学,日本东北大学 长春 130012
摘    要:本文用化学气相沉积(CVD)法,以TiCl_4-CH_4-H_2为原料气体,在不锈钢表面获得了致密的TiC膜.研究了TiC的成膜速度、表面形貌和晶体择优取向与沉积条什的关系.结果表明,沉积温度T_(dep),碳钛比CH_4/TiCl_4强烈地影响了TiC的成膜速度、表面形貌和晶体择优取向.CH_4/TiCl_4低时,TiC晶体的择优取向为(220):而CH_4/TiCl_4高时,TiC晶体的择优取向为(200).TiC晶体的择优取向主要取决于气氛中活性碳的平衡浓度。

关 键 词:择优取向  成膜速度  TiC膜  不锈钢
收稿时间:1992-07-18
修稿时间:1992-07-18

PREFERRED ORIENTATION OF DEPOSITED TiC COATING ON STEEL BY CVD
GUO Chengyan ,GOTO Takashi,HIRAI Toshio.PREFERRED ORIENTATION OF DEPOSITED TiC COATING ON STEEL BY CVD[J].Acta Metallurgica Sinica,1992,28(7):85-89.
Authors:GUO Chengyan  GOTO Takashi  HIRAI Toshio
Affiliation:GUO Chengyan (Jilin Institute of Technology,Changchun),GOTO Takashi,HIRAI Toshio (Tohoku University,Japan)
Abstract:Investigation was made of the deposition rate, surface morphology and crystal preferred orientation of the dense TiC coating onto austenitic stainless steel in relation with CH_4/TiCl_4 mole ratio and temperature adopted in CVD processing. When the CH_4/TiCl_4 ratio is low or high, their preferred orientation may be (220) or (200), respectively, which is mainly dependent on the equilibrium concentration of active carbon in vapour phase.
Keywords:TiC coating  preferred orientation  deposition rate  surface morphology  
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