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掺杂浓度对槽栅nMOSFET特性的影响研究
引用本文:童建农,邹雪城,沈绪榜. 掺杂浓度对槽栅nMOSFET特性的影响研究[J]. 微电子学, 2004, 34(5): 510-513
作者姓名:童建农  邹雪城  沈绪榜
作者单位:华中科技大学,IC设计中心,湖北,武汉,430073
摘    要:讨论了槽栅结构nMOSFET的掺杂浓度对器件特性的影响,并通过二维器件仿真程序PISCES—Ⅱ进行了计算模拟比较。结果表明,提高衬底掺杂浓度,能使源漏区与沟道之间的拐角效应增大,对热载流子效应抑制的作用明显;提高沟道掺杂浓度,能减小沟道电荷的调制效应,使阈值电压更好。调节沟道掺杂浓度比调节衬底掺杂浓度对器件的影响更大。

关 键 词:槽栅MOSFET 掺杂 短沟道效应 热载流子退化
文章编号:1004-3365(2004)05-0510-04

Effects of Doping Concentration on the Characteristics of Grooved-Gate MOSFET''''s
TONG Jian-nong,ZOU Xue-cheng,SHEN Xu-bang. Effects of Doping Concentration on the Characteristics of Grooved-Gate MOSFET''''s[J]. Microelectronics, 2004, 34(5): 510-513
Authors:TONG Jian-nong  ZOU Xue-cheng  SHEN Xu-bang
Abstract:Effects of doping concentration on the characteristics of grooved-gate MOSFET's are simulated using classical 2-D device simulator PISCES-II. It has been shown that the corner effect is strengthened with increasing substrate doping concentration, which improves the hot-carrier-effect immunity, and the modulation effect of the channel electric charge is weakened with increasing channel doping concentration, which results in better threshold voltage. The influence of channel doping on the characteristics of grooved-gate MOSFET's is larger than substrate doping.
Keywords:Grooved-gate MOSFET  Doping  Short channel effect  Hot carrier degradation
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