| 基片表面预处理对热丝CVD法生长金钢石薄膜的影响 |
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| 引用本文： | 杨国伟,毛友德.基片表面预处理对热丝CVD法生长金钢石薄膜的影响[J].微细加工技术,1993(1). |
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| 作者姓名： | 杨国伟 毛友德 |
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| 作者单位： | 航空航天部第014中心，合肥工业大学应用物理系 洛阳 471009，合肥 230009 |
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| 摘 要： | 本文研究了在热丝CVD方法生长金刚石薄膜中,基片表面的研磨处理对金刚石成核密度以及生长膜结构的影响。发现基片表面的预处理一方面可以提高金刚石的成核密度,另一方面又使生长膜的结构变得不利于应用。最后讨论了基片表面预处理对金刚石成核作用的机理和两种新的表面预处理方法。
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| 关 键 词： | 热丝CVD 金刚石薄膜 表面研磨 |
THE EFFECT OF SUBSTRATE SURFACE PRE-POLISHING ON DIAMOND THIN FILMS BY HFCVD |
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| Yang Guowei.THE EFFECT OF SUBSTRATE SURFACE PRE-POLISHING ON DIAMOND THIN FILMS BY HFCVD[J].Microfabrication Technology,1993(1). |
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| Authors: | Yang Guowei |
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| Abstract: | The effect of substrate surface pre-polishing on nucleation of diamond and structure of diamond thin films by HFCVD has been studied. We discovered that the pre-polifhing of substrate surface can make diamond nucleation increase, meanwhile make structure of diamond thin films become worse for their application. Finally, we discussed it's mechanism of and two new methods of substrate surface pre-handle. |
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| Keywords: | HFCVD diamond thin film surface polishing |
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