Kinetics of aluminium deposition from aluminium chloride—alkali chloride melts |
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Authors: | R. Ødegard A. Bjørgum Å. Sterten J. Thonstad R. Tunold |
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Affiliation: | Laboratories of Industrial Electrochemistry, University of Trondheim, The Norwegian Institute of Technology, 7034 Trondheim-NTH, Norway |
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Abstract: | The kinetics of aluminium deposition from NaClAlCl3 and NaClKClAlCl3 melts (cAlCl3 < 0.4 mol%) was studied by linear sweep voltammetry and potential step amperometry. The reduction of AlCl3 on tungsten and aluminium electrodes was found to be diffusion controlled. The diffusion coefficients of AlCl3 were: 3.5 × 10?5 cm2 s?1 at 820°C in NaClAlCl3, 2.7 × 10?5cm2s?1 at 825°C, and 2.1 × 10?5cm2s?1 at 705°C in KClNaClAlCl3. The rate constant for AlCl3 reduction at these conditions was found to be in the order of 0.2 cm s?1, in good agreement with extrapolated literature data. |
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