| 调质结构对Ti-TiN-Zr-ZrN多层膜力学性能影响 |
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| 引用本文： | 林松盛,周克崧,冯诚诚,代明江,石倩,赵升升. 调质结构对Ti-TiN-Zr-ZrN多层膜力学性能影响[J]. 稀有金属材料与工程, 2018, 47(11): 3468-3472 |
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| 作者姓名： | 林松盛 周克崧 冯诚诚 代明江 石倩 赵升升 |
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| 作者单位： | 广东省新材料研究所,广东省新材料研究所,广东省新材料研究所,广东省新材料研究所,广东省新材料研究所,深圳职业技术学院 |
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| 基金项目： | 广东省省级科技计划项目(2014B050503005,2016GDASPT-0206,2014B070706026) |
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| 摘 要： | 采用真空阴极电弧离子镀技术,在TC11钛合金和单晶Si片表面分别沉积不同调制周期、不同RTi/TiN:RZr/ZrN调制比和不同厚度的Ti-TiN-Zr-ZrN多层膜。用扫描电镜、X射线衍射仪、划痕仪、显微硬度计和应力测试仪分析测试了多层膜的截面形貌、厚度、结合力、硬度和残余应力；重点研究了调制周期、调制比和膜层厚度等调制结构的改变对多层膜残余应力和相关性能的影响。结果表明：增加调制周期,则残余应力降低,结合力和硬度均增大；降低RTi/TiN:RZr/ZrN调制比，则残余应力增大，结合力下降，硬度增加；增大多层膜厚度，则残余应力略有上升，结合力和硬度都提高，当膜层厚度达到7.54μm后，硬度稳定在30Gpa左右。
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| 关 键 词： | Ti-TiN-Zr-ZrN多层膜 调制结构 残余应力 电弧离子镀 |
| 收稿时间： | 2017-01-18 |
| 修稿时间： | 2017-02-10 |
Effect of modulation structure on mechanical properties of Ti-TiN-Zr-ZrN multilayer films |
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| Lin Songsheng,Zhou Kesong,Feng Chengcheng,Dai Mingjiang,Shi Qian and Zhao Shengsheng. Effect of modulation structure on mechanical properties of Ti-TiN-Zr-ZrN multilayer films[J]. Rare Metal Materials and Engineering, 2018, 47(11): 3468-3472 |
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| Authors: | Lin Songsheng Zhou Kesong Feng Chengcheng Dai Mingjiang Shi Qian Zhao Shengsheng |
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| Affiliation: | Guangdong Institute of New Materials,National Engineering Laboratory for Surface Engineering Technology,The Key Lab of Guangdong for Modern Surface Engineering Technology,Guangdong Institute of New Materials,National Engineering Laboratory for Surface Engineering Technology,The Key Lab of Guangdong for Modern Surface Engineering Technology,Guangdong Institute of New Materials,National Engineering Laboratory for Surface Engineering Technology,The Key Lab of Guangdong for Modern Surface Engineering Technology,Guangdong Institute of New Materials,National Engineering Laboratory for Surface Engineering Technology,The Key Lab of Guangdong for Modern Surface Engineering Technology,Guangdong Institute of New Materials,National Engineering Laboratory for Surface Engineering Technology,The Key Lab of Guangdong for Modern Surface Engineering Technology,Shenzhen Polytechnic College |
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| Abstract: | |
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| Keywords: | Ti-TiN-Zr-ZrN multilayer film Modulation structure Residual stress Arc ion plating |
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