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Heavy-ion-induced luminescence of amorphous SiO2 during nanoparticle formation
Authors:Vassili Bandourko  Naoki Umeda  Oleg Plaksin  Naoki Kishimoto
Affiliation:

aMoscow Engineering Physics Institute, Kashirskoe sh. 31, Moscow 115409, Russia

bNanomaterials Laboratory, National Institute for Materials Science, 3-13 Sakura, Tsukuba, Ibaraki 305-0003, Japan

cSSC RF, Institute of Physics and Power Engineering, Obninsk 249033, Russia

dJapan Machinery Co., 5-6, 8-chome, Ginza, Chuo-ku, Tokyo 104-0061, Japan

Abstract:Silica glass was implanted with negative 60 keV Cu ions at an ion flux from 5 to 75 μA/cm2 up to a fluence of 1 × 1017 ions/cm2 at initial sample temperatures of 300, 573 and 773 K. Spectra of ion-induced photon emission (IIPE) were collected in situ in the range from 250 to 850 nm. Optical absorption spectra of implanted specimens were ex situ measured in the range from 190 to 2500 nm.

IIPE spectra showed a broad band centered around 560 nm (2.2 eV) that was assigned to Cu+ solutes. The band appeared at the onset of irradiation, increased in intensity up to a fluence of about 5 × 1015 ions/cm2 and then gradually decreased indicating three stage of the ion beam synthesis of nanoclusters: accumulation of implants, nucleation and growth nanoclusters. The IIPE intensity normalized on the ion flux is independent on the ion flux below 20 μA/cm2at higher fluences. The intensity of the band increased with increasing samples temperature, when optical absorption spectra reveal the increase of Cu nanoparticles size.

Keywords:Ion implantation  Metal nanoparticles  Silica glass  Ion-induced photon emission
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