Fabrication of high current and low profile micromachined inductorwith laminated Ni/Fe core |
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Authors: | Jin-Woo Park Jae Yeong Park Yeun-Ho Joung Allen MG |
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Affiliation: | Sch. of Electr. & Comput. Eng., Georgia Inst. of Technol., Atlanta, GA; |
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Abstract: | A new process for the fabrication of high current and very low profile micromachined inductors has been developed. This process involves the combination of mechanical lamination and electrodeposition of copper windings by means of LIGA-like lithography through thick epoxy photoresists. The dimension of the fabricated inductor is 16 mm×19 mm×1 mm. The fabricated inductor has an inductance value of 1.2 μH with DC saturation current of 3 A and an electrical resistance of less than 30 mΩ at 10 kHz |
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