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纯水系统EDI装置的化学清洗技术
引用本文:郭银明,李为,段宏锋.纯水系统EDI装置的化学清洗技术[J].净水技术,2014(1):30-33.
作者姓名:郭银明  李为  段宏锋
作者单位:[1]陕西天宏硅材料有限责任公司,陕西咸阳712038 [2]上海水合环境工程有限公司,上海200011
摘    要:EDI装置广泛应用于纯水系统深度除盐工艺,该文介绍了EDI装置污染的特征和原因,分析了EDI装置清洗的一般原则和方法,对EDI装置清洗剂的配方和应用工艺进行了探讨。

关 键 词:电去离子(EDI)  化学清洗  灭菌  纯水系统

Chemical Cleaning Technology for EDI Device in Pure Water Production System
Guo Yinming,Li Wei,Duan Hongfeng.Chemical Cleaning Technology for EDI Device in Pure Water Production System[J].Water Purifcation Technology,2014(1):30-33.
Authors:Guo Yinming  Li Wei  Duan Hongfeng
Affiliation:1. Shanxi Tianhong Silicon Material Co. Ltd. , Xianyang 712038, China; 2. Shanghai Water-Partner Environmental Engineering Co. , Ltd. , Shanghai 200011, China)
Abstract:The EDI device is widely applied in pure water production process. The reason and characteristic of fouling for EDI device were introduced in this paper. The principle and method of cleaning technology were analyzed. The cleaning chemicals and their application were discussed.
Keywords:electrodeionization (EDI) chemical cleaning sterilization pure water system
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