Computer analysis of random and channeled backscattering spectra |
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Authors: | Yoshiaki Kido Yukio Oso |
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Affiliation: | Toyota Central Research and Development Laboratories Inc., 41-1, Aza Yokomichi, Oaza Nagakute, Nagakute-cho, Aichi-gun, Aichi-ken, 480-11, Japan |
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Abstract: | Three types of computer codes are described which simulate random and channeled backscattering spectra from: (1) multielemental, multilayered structures, (2) specimens with inhomogneously distributed impurities and (3) single crystals damaged by ion implantation. Both effects of energy fluctuation and isotopic shifts from each constituent element are taken into account in the simulation. The elemental compositions and layer thicknesses of multielemental, multilayered films and the damage distributions induced by ion implantation are determined by fitting the simulated spectrum to the corresponding experimental one. The effect of surface and interface roughness on the spectrum shape is also discussed. |
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