硅片表面原子层沉积Al_2O_3薄膜及其长期腐蚀行为

目前,对硅基材表面利用原子层沉积技术(ALD)制备的Al_2O_3薄膜的耐蚀性鲜见研究报道。利用ALD技术在硅片表面制备非晶Al_2O_3薄膜。采用扫描电镜(SEM)观察薄膜的表面及截面形貌;采用X射线光电子能谱仪(XPS)分析薄膜的价键结构;通过交流阻抗谱和动电位极化曲线研究硅基材与薄膜在不同浸泡时间下的耐腐蚀性能;采用光学显微镜观察腐蚀过程中基材与薄膜的表面形貌。结果表明:ALD非晶态Al_2O_3薄膜具有致密结构,在浸泡过程中,镀膜基材比裸基材具有更好的耐腐蚀性能;且在长期浸泡情况下,Al_2O_3薄膜对基材仍能起到良好的保护作用。

Long-Term Corrosion Behavior of Atomic Layer Deposited Al2O3 Thin Films on Silicon Wafer

Al2O3 thin films were prepared on silicon wafer by atomic layer deposition (ALD) technology.The surface/interface morphologies and chemical bonding structures of the films were observed by means of scanning electron microscopy (SEM) and X-ray photoelectron spectroscopy (XPS).The corrosion protection properties of Al2O3 films were investigated by means of alternating current impedance spectroscopy and potentiodynamic polarization curves.Moreover,the surface morphology of the substrate and film during corrosion process was observed by optical microscope.Results showed that the amorphous Al2O3 films prepared by ALD had dense structure,and during immersion process,the substrate with films performed better corrosion resistance than the exposed substrate.Furthermore,under the long-term immersion conditions,Al2O3 films still protected the substrate well from corrosion.