| 成像干涉光刻技术及其频域分析 |
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| 引用本文： | 刘娟,冯伯儒,张锦. 成像干涉光刻技术及其频域分析[J]. 光电工程, 2004, 31(10): 24-27 |
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| 作者姓名： | 刘娟 冯伯儒 张锦 |
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| 作者单位： | 中国科学院光电技术研究所,微细加工光学技术国家重点实验室,四川,成都,610209;中国科学院研究生院,北京,100039;中国科学院光电技术研究所,微细加工光学技术国家重点实验室,四川,成都,610209 |
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| 基金项目： | 国家自然科学基金资助(60276043#) |
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| 摘 要： | 传统光学光刻技术(OL)由于其固有的限制,虽然可对任意图形成像,但分辨力较低。无掩模激光干涉光刻技术(IL)的分辨力可达l /4,却局限于周期图形。成像干涉光刻技术(IIL)结合了二者的优点,用同一个系统分次传递物体不同的空间频率,能更有效地传递物体的信息,以高分辨力对任意图形成像。初步模拟研究表明,在同样的曝光波长和数值孔径下,对同样特征尺寸的掩模图形,IIL得到的结果好于OL。在CD=150nm时,IIL相对于OL把分辨力提高了1.5倍多。
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| 关 键 词： | 成像干涉光刻 空间频率 频域分析 |
| 文章编号： | 1003-501X(2004)10-0024-04 |
| 收稿时间： | 2004-05-31 |
| 修稿时间： | 2004-05-31 |
Imaging interferometric lithography and its spatial frequency analysis |
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| LIU Juan,FENG Bo-ru,ZHANG Jin. Imaging interferometric lithography and its spatial frequency analysis[J]. Opto-Electronic Engineering, 2004, 31(10): 24-27 |
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| Authors: | LIU Juan FENG Bo-ru ZHANG Jin |
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| Abstract: | Conventional Optical Lithography (OL) has a lower resolution because of its inherent limits though it can image arbitrary patterns. Interferometric Lithography (IL) has a high resolution of l/4 but is restricted to periodic structure. Imaging Interferometric Lithography (IIL) integrates the merits of OL and IL, and transfers different components of spatial frequencies at different time and passes structure information more effectively thus imaging arbitrary patterns at high resolution. Initial modeling shows that IIL can image better than OL for the same features with same exposure wavelength and numerical aperture of imaging lens. When CD is 150nm, IIL improves the resolution for more than 1.5 times over OL. |
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| Keywords: | Imaging interferometric lithography Spatial frequency Frequency analysis |
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